Study of High-pressure Behavior of Goethite up to 30 GPa using X-ray Diffraction, Raman Spectroscopy and Electrical Impedance

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ADS bibcode
2019AGUFMMR23D0148T
year
2019
Listed Authors
Tang, R.
Chen, J.
Zeng, Q. C.
Li, Y.
Liang, X.
Listed Institutions
Center for High Pressure Science &Technology Advanced Research, Changchun, China
Florida International Univ., Miami, FL, United States
Stanford University, Palo Alto, CA, United States
Jilin University, Changchun, China
Florida International Univ., Miami, United States

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