Study of High-pressure Behavior of Goethite up to 30 GPa using X-ray Diffraction, Raman Spectroscopy and Electrical Impedance
- ADS bibcode
- 2019AGUFMMR23D0148T
- year
- 2019
- Listed Authors
- Tang, R.
- Chen, J.
- Zeng, Q. C.
- Li, Y.
- Liang, X.
- Listed Institutions
- Center for High Pressure Science &Technology Advanced Research, Changchun, China
- Florida International Univ., Miami, FL, United States
- Stanford University, Palo Alto, CA, United States
- Jilin University, Changchun, China
- Florida International Univ., Miami, United States
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Linked Institutions