Extreme ultraviolet lithography
- Wikidata
- https://www.wikidata.org/wiki/Q371965
- OpenAlex ID
- https://openalex.org/C162996421 (API record)
- OpenAlex Description
- a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
- OpenAlex Level [?]
- 2
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